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Proceedings Paper

Patterning of organic photovoltaic on R2R processed thin film barriers using IR laser sources
Author(s): H. Fledderus; H. B. Akkerman; A. Salem; N. Friedrich Schilling; U. Klotzbach
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Paper Abstract

We present the development of laser processes for flexible OPV on roll-to-roll (RR2R) produced thin film barrier with indium tin oxide (ITO) as transparent conductive (TC) bottom electrode. Direct laser structuring of ITO on such barrier films (so-called P1 process) is very challenging since the layers are all transparent, a complete electrical isolation is required, and the laser process should not influence the barrier performance underneath the scribes. Based on the optical properties off the SiN and ITTO, ultra-short pulse lasers inn picosecond and femtosecond regime with standard infrared (IR) wavelength as well as lasers with new a wavelength (22 μm regime) are tested for this purpose. To determine a process window for a specific laser a fixed methodology is adopted. Single pulse ablation tests were followed by scribing experiments where the pulse overlap was tuned by varying laser pulse fluence, writing speed and frequency. To verify that the laser scribing does not result inn barrier damage underneath, a new test method was developed based on the optical Ca-test. This method shows a clear improvement in damage analysis underneath laser scribes over normal optical inspection methods (e.g. microscope, optical profiler, SEM). This way clear process windows can be obtained for IR TC patterning.

Paper Details

Date Published: 17 February 2017
PDF: 9 pages
Proc. SPIE 10092, Laser-based Micro- and Nanoprocessing XI, 100920I (17 February 2017); doi: 10.1117/12.2248533
Show Author Affiliations
H. Fledderus, Holst Ctr. (Netherlands)
H. B. Akkerman, Holst Ctr. (Netherlands)
A. Salem, Holst Ctr. (Netherlands)
N. Friedrich Schilling, Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (Germany)
Heliatek GmbH (Germany)
U. Klotzbach, Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (Germany)


Published in SPIE Proceedings Vol. 10092:
Laser-based Micro- and Nanoprocessing XI
Udo Klotzbach; Kunihiko Washio; Rainer Kling, Editor(s)

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