Share Email Print
cover

Proceedings Paper

X-ray optics R&D at NSLSII: focus on optical metrology development
Author(s): Mourad Idir; Lei Huang; Konstantine Kaznatcheev; Shinan Qian; Guillaume Dovillaire; Rafael Mayer
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The push for high quality x-ray optics is closely linked to improvements in metrology technology. During the last decade, we have seen an ultra-fast progress in x-ray optics performances. This enhancement is directly linked to the development of the necessary tools to control these optical components. These metrology tools are necessary for the fabrication (to guide some polishing deterministic process) and also for the ultimate characterization used to validate surface parameters (often inside their own mechanical support) prior to installation in a beam line. It is now necessary to characterize optical surface figure, slope errors and roughness on meter-long optics over spatial frequencies as short as 0.1 mm and with slope errors reaching less than 100 nrad rms or surface figure errors close to 1 nm in order to not spoiled and preserve the high brightness made available by third and fourth generation synchrotron/FEL sources like NSLSII or LCLS. For this purpose, the new NSLS-II Optical Metrology Laboratory (NSLSII-OML) includes commercial instruments for measuring long spatial frequency figure errors, mid spatial frequencies and high frequency roughness and had started some research and development activities. This paper provides a brief description of the instruments currently available in the laboratory and gives an overview of the very active research and development efforts within the NSLSII-OML.

Paper Details

Date Published: 25 October 2016
PDF: 6 pages
Proc. SPIE 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics, 96870G (25 October 2016); doi: 10.1117/12.2248223
Show Author Affiliations
Mourad Idir, Brookhaven National Lab. (United States)
Lei Huang, Brookhaven National Lab. (United States)
Konstantine Kaznatcheev, Brookhaven National Lab. (United States)
Shinan Qian, Brookhaven National Lab. (United States)
Guillaume Dovillaire, Imagine Optic (France)
Rafael Mayer, Imagine Optic (France)


Published in SPIE Proceedings Vol. 9687:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics
Shinan Qian; Mourad Idir; Daniele Cocco; Tiqiao Xiao; Kazuto Yamauchi, Editor(s)

© SPIE. Terms of Use
Back to Top