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Proceedings Paper

A study of SU-8 photoresist in deep trenches for silicon-embedded microinductors
Author(s): Elias Laforge; Caroline Rabot; Ningning Wang; Zoran Pavlovic; Paul McCloskey; Cian O'Mathúna
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Paper Abstract

Epoxy-based resist SU-8 is widely used in the development and fabrication of high-aspect-ratio (HAR) MEMS structures. It has proven to be a suitable photoresist combining thick layer coating and good adhesion on silicon substrates as well as possessing good mechanical and chemical stability. However, the trend towards minia- turization and increasing packaging density has pushed the demand for challenging micro-machining processes. As an example, a novel design of a MEMS microinductor requires a dielectric permanent layer coated in deep silicon trenches in order to insulate copper windings from the magnetic material deposited in these trenches. This requires the development of a photolithography process which enables the coating of a void-free layer filling the trenches. In this paper, the use of thick SU-8 photoresist for filling deep silicon trenches is investigated. Different SU-8 formulations are analyzed, processed and results are compared. As a result, an optimized process is developed to achieve void-free filled trenches and a uniform planar layer above them, with near vertical sidewall patterns.

Paper Details

Date Published: 20 October 2016
PDF: 5 pages
Proc. SPIE 10032, 32nd European Mask and Lithography Conference, 100320O (20 October 2016); doi: 10.1117/12.2247894
Show Author Affiliations
Elias Laforge, Tyndall National Institute, Univ. College Cork (Ireland)
Caroline Rabot, Tyndall National Institute, Univ. College Cork (Ireland)
Ningning Wang, Tyndall National Institute, Univ. College Cork (Ireland)
Zoran Pavlovic, Tyndall National Institute, Univ. College Cork (Ireland)
Paul McCloskey, Tyndall National Institute, Univ. College Cork (Ireland)
Cian O'Mathúna, Tyndall National Institute, Univ. College Cork (Ireland)


Published in SPIE Proceedings Vol. 10032:
32nd European Mask and Lithography Conference
Uwe F.W. Behringer; Jo Finders, Editor(s)

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