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Proceedings Paper

Imaging ellipsometer with large field-of-view
Author(s): Liyuan Gu; Aijun Zeng; Shiyu Hu; Qiao Yuan; Weilin Cheng; Shanhua Zhang; Guohang Hu; Hongbo He; Huijie Huang
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Paper Abstract

A polarizer-compensator-sample-analyzer (PCSA) imaging ellipsometer with large field of view is presented. The sample is imaged on a CCD sensor by a telecentric imaging system and its tilt is monitored by an optical autocollimator. The sample, the telecentric imaging system and the CCD sensor satisfy the Scheimpflug condition. In measurement, the light extinction measurement method and the four quadrants average method are used to improve the accuracy. In experiments, a chromium thin film sample is measured by the imaging ellipsometer and a spectroscopic ellipsometer. The measurement results by two ellipsometers are consistent. The usefulness of the imaging ellipsometer is verified.

Paper Details

Date Published: 24 November 2016
PDF: 9 pages
Proc. SPIE 10023, Optical Metrology and Inspection for Industrial Applications IV, 1002315 (24 November 2016); doi: 10.1117/12.2247848
Show Author Affiliations
Liyuan Gu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Aijun Zeng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Shiyu Hu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Qiao Yuan, Shanghai Institute of Optics and Fine Mechanics (China)
Weilin Cheng, Shanghai Institute of Optics and Fine Mechanics (China)
Shanhua Zhang, Shanghai Institute of Optics and Fine Mechanics (China)
Guohang Hu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Hongbo He, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Huijie Huang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 10023:
Optical Metrology and Inspection for Industrial Applications IV
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

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