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Proceedings Paper

Characterization of Akiyama probe applied to dual-probes atomic force microscope
Author(s): Hequn Wang; Sitian Gao; Wei Li; Yushu Shi; Qi Li; Shi Li; Zhendong Zhu
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Paper Abstract

The measurement of nano-scale line-width has always been important and difficult in the field of nanometer measurements, while the rapid development of integrated circuit greatly raises the demand again. As one kind of scanning probe microscope (SPM), atomic force microscope (AFM) can realize quasi three-dimensional measurement, which is widely used in nanometer scale line-width measurement. Our team researched a dual-probes atomic force microscope, which can eliminate the prevalent effect of probe width on measurement results. In dual-probes AFM system, a novel head are newly designed. A kind of self-sensing and self-exciting probes which is Nanosensors cooperation’s patented probe—Akiyama probe, is used in this novel head. The Akiyama probe applied to dual-probe atomic force microscope is one of the most important issues. The characterization of Akiyama probe would affect performance and accuracy of the whole system. The fundamental features of the Akiyama probe are electrically and optically characterized in “approach-withdraw” experiments. Further investigations include the frequency response of an Akiyama probe to small mechanical vibrations externally applied to the tip and the effective loading force yielding between the tip and the sample during the periodic contact. We hope that the characterization of the Akiyama probe described in this paper will guide application for dual-probe atomic force microscope.

Paper Details

Date Published: 19 October 2016
PDF: 6 pages
Proc. SPIE 10155, Optical Measurement Technology and Instrumentation, 101553R (19 October 2016); doi: 10.1117/12.2247464
Show Author Affiliations
Hequn Wang, National Institute of Metrology (China)
Sitian Gao, National Institute of Metrology (China)
Wei Li, National Institute of Metrology (China)
Yushu Shi, National Institute of Metrology (China)
Qi Li, National Institute of Metrology (China)
Shi Li, National Institute of Metrology (China)
Zhendong Zhu, National Institute of Metrology (China)


Published in SPIE Proceedings Vol. 10155:
Optical Measurement Technology and Instrumentation
Sen Han; JiuBin Tan, Editor(s)

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