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Proceedings Paper

Evaluation of the photoelectric performance parameters measurement for electron multiplying CCD
Author(s): Jie Fang; Wenwen Zhang; Jin Gao; Chaowei Li; Qian Chen; Guohua Gu
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Paper Abstract

The measurement of the electron multiplying CCD(EMCCD) photoelectric performance parameters plays an important role in the development of the chip and imaging system. Measurement uncertainty is an important index to evaluate the quality of the measurement results. A measurement platform for EMCCD photoelectric performance parameters is set up. An EMCCD camera’s photoelectric performance parameters are measured based on photon transfer technique and the uncertainty of the measurement results is analyzed. Based on the method of GUM, the influences of the integrating sphere light source stability, EMCCD camera electronics system stability, installation posture, stray light in dark environment, camera's digital resolution and measurement sampling on the measurement results are analyzed. Based on the theoretical model of different photoelectric performance parameters, the uncertainty sources are discussed. The combined standard uncertainty is determined by the type A uncertainty and the type B uncertainty. The uncertainty evaluation model is established for the measurement of EMCCD photoelectric performance parameters, including convert gain, readout noise, full well, signal to noise ratio and multiplication gain. The uncertainty of the measurement results is calculated by using the established model. At last, we get the following results: relative standard uncertainty of the convert gain is 0.637% (k = 1), relative standard uncertainty of the readout noise is 0.653% (k = 1), relative standard uncertainty of the full well is 2.384% (k = 1), relative standard uncertainty of the signal to noise ratio is 2.301% (k = 1) and relative standard uncertainty of the multiplication gain is 1.259% (k = 1). The above uncertainty results show that the measurement results of this paper are accurate and reliable.

Paper Details

Date Published: 19 October 2016
PDF: 10 pages
Proc. SPIE 10155, Optical Measurement Technology and Instrumentation, 101552Q (19 October 2016); doi: 10.1117/12.2247129
Show Author Affiliations
Jie Fang, Nanjing Univ. of Science and Technology (China)
Wenwen Zhang, Nanjing Univ. of Science and Technology (China)
Jin Gao, Northwest Institute of Mechanical and Electrical Engineering (China)
Chaowei Li, Northwest Institute of Mechanical and Electrical Engineering (China)
Qian Chen, Nanjing Univ. of Science and Technology (China)
Guohua Gu, Nanjing Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 10155:
Optical Measurement Technology and Instrumentation
Sen Han; JiuBin Tan, Editor(s)

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