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Proceedings Paper

Diamond membranes for x-ray lithography
Author(s): Charles R. Guarnieri; Jerome J. Cuomo; S. J. Whitehair; B. S. Berry; W. C. Pritchet; Raul E. Acosta; Alan D. Wilson
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Paper Abstract

Diamond membranes are being developed for x-ray lithography masks. Typically these 1-3 im thick membrane films are deposited on Si substrates using microwave driven plasmas. To obtain smooth films with uniform tensile stress spray and electrophoretic deposition of 0. 1 zm diamond seeds were used to control the initial nucleation and growth of the diamond films. The films have a room ternperature tensile stress of 25-125 MPa. The temperature dependence of the stress is due to the tensile growth stress of the diamond film and the thermal stress of the diamond-Si layer structure. The films have a biaxial modulus of 800 GPa. X-ray lithography masks have been made and used to print patterns with x-rays from a synchrotron source. 1 .

Paper Details

Date Published: 1 December 1990
PDF: 5 pages
Proc. SPIE 1325, Diamond Optics III, (1 December 1990); doi: 10.1117/12.22471
Show Author Affiliations
Charles R. Guarnieri, IBM/Thomas J. Watson Research (United States)
Jerome J. Cuomo, IBM/Thomas J. Watson Research (United States)
S. J. Whitehair, IBM/Thomas J. Watson Research (United States)
B. S. Berry, IBM/Thomas J. Watson Research (United States)
W. C. Pritchet, IBM/Thomas J. Watson Research (United States)
Raul E. Acosta, IBM/Thomas J. Watson Research (United States)
Alan D. Wilson, IBM/Thomas J. Watson Research (United States)


Published in SPIE Proceedings Vol. 1325:
Diamond Optics III
Albert Feldman; Sandor Holly, Editor(s)

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