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Proceedings Paper

PMJ16 Best Paper: Multi-beam mask writer BMB-1000 and its application field
Author(s): Hiroshi Matsumoto; Hideo Inoue; Hiroshi Yamashita; Hirofumi Morita; Satoru Hirose; Munehiro Ogasawara; Hirokazu Yamada; Kiyoshi Hattori
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Paper Details

Date Published:
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Proc. SPIE 9985, Photomask Technology 2016, 99850E; doi: 10.1117/12.2246944
Show Author Affiliations
Hiroshi Matsumoto, NuFlare Technology, Inc. (Japan)
Hideo Inoue, NuFlare Technology, Inc. (Japan)
Hiroshi Yamashita, NuFlare Technology, Inc. (Japan)
Hirofumi Morita, NuFlare Technology, Inc. (Japan)
Satoru Hirose, NuFlare Technology, Inc. (Japan)
Munehiro Ogasawara, NuFlare Technology, Inc. (Japan)
Hirokazu Yamada, NuFlare Technology, Inc. (Japan)
Kiyoshi Hattori, NuFlare Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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