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Proceedings Paper

Design and optimization of a silica waveguide based visible etched diffraction grating with uniform loss
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Paper Abstract

A novel method for designing a silica waveguide based visible etched diffraction grating (EDG) with uniform loss is proposed. The designed 1st-order EDG comprises 121 output waveguides with a 2.5 nm channel spacing at a wavelength range from 400 nm to 700 nm. Using the conventional flat-field design with two-stigmatic-points method, the simulated channel loss non-uniformity of a conventional EDG is 2.66 dB. By changing the central output waveguide position and rotating the angles of grating facets according to an appropriately designed distribution function, the loss non-uniformity is reduced to 1.36 dB and the highest loss of marginal channels is decreased from 2.69 dB to 2.13 dB simultaneously. With a total chip size of 30 mm×16 mm, this visible EDG is suitable for realization of spectrometer-on-chip. The proposed design method can achieve insertion loss uniformity in a wide wavelength range with no additional element or extra fabrication step.

Paper Details

Date Published: 19 October 2016
PDF: 6 pages
Proc. SPIE 10152, High Power Lasers, High Energy Lasers, and Silicon-based Photonic Integration, 101520U (19 October 2016); doi: 10.1117/12.2246749
Show Author Affiliations
Han Wang, Zhejiang Univ. (China)
Minyue Yang, Zhejiang Univ. (China)
Tingting Lang, China Jiliang Univ. (China)
Jinyan Song, Zhejiang Univ. (China)
Mingyu Li, Zhejiang Univ. (China)
Jian-Jun He, Zhejiang Univ. (China)


Published in SPIE Proceedings Vol. 10152:
High Power Lasers, High Energy Lasers, and Silicon-based Photonic Integration
Lijun Wang; Zhiping Zhou, Editor(s)

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