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Proceedings Paper

Formation mechanism of the photomask blanks material related haze
Author(s): Jung-Jin Kim; Junyoul Choi; Soowan Koh; Minho Kim; Jiyoung Lee; Han-Shin Lee; Byung Gook Kim; Chan-uk Jeon
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Paper Abstract

We have observed a new type haze of which formation deviates from the generally accepted models with respect to the size, shape, and removability by chemicals. It has very small size of 50~100nm and are crowded around the cell boundary, while the typical haze doesn’t prefer a special region on mask in the majority of cases. It is hard to remove by general cleaning, while the typical haze is easily removed by general cleaning process and even de-ionized water. It is confirmed that the source of the haze is blank material related ions which are formed by chemical etching of blanks during mask cleaning process or the photomask blanks itself.

Paper Details

Date Published: 20 May 2016
PDF: 8 pages
Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 99840W (20 May 2016); doi: 10.1117/12.2246678
Show Author Affiliations
Jung-Jin Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Junyoul Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Soowan Koh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Minho Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jiyoung Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Han-Shin Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byung Gook Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan-uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9984:
Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
Nobuyuki Yoshioka, Editor(s)

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