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Proceedings Paper

Investigation of single lateral mode for 852nm diode lasers with ridge waveguide design
Author(s): Chu Liu; Baolu Guan; Guoxin Mi; Yiru Liao; Zhenyang Liu; Jianjun Li; Chen Xu
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Paper Abstract

852nm Narrow linewidth lasers can be widely used in the field of ultra-fine spectrum measurement, Cs atomic clock control, satellite and optical fiber communication and so on. Furthermore, the stability of the single lateral mode is a very important condition to guarantee the narrow linewidth lasers. Here we investigate experimentally the influence of the narrow ridge structure and asymmetrical waveguide design on the stability single lateral mode of an 852nm diode laser. According to the waveguide theoretical analysis, ridge mesa etch depth (Δη , related to the refractive index difference of parallel to the junction) and ridge mesa width (the narrower the more control force to low order mode) are the main elements for lateral modes. In this paper, we designed different structures to investigate and verify major factors for lateral mode by experiment, and to confirm our thought. Finally, the 5μm mesa ridge laser, 800nm etch depth, with groove structure obtains excellent steady single lateral mode output by 150mA operating current and 30°C temperature. The optical spectrum FWHM is 0.5nm and side mode suppression ratio is 27dBm with uncoated. The laser with 1mm cavity length showed the threshold current of 50mA, a lasing wavelength of λ = 852.6nm, slope efficiency of above 0.7mW/mA. We accomplished single lateral mode of ridge waveguide edge-emitting lasers which can also be used as a laser source in the ultra-narrow linewidth external cavity laser system.

Paper Details

Date Published: 9 November 2016
PDF: 6 pages
Proc. SPIE 10017, Semiconductor Lasers and Applications VII, 1001709 (9 November 2016); doi: 10.1117/12.2246549
Show Author Affiliations
Chu Liu, Beijing Univ. of Technology (China)
Baolu Guan, Beijing Univ. of Technology (China)
Guoxin Mi, Beijing Univ. of Technology (China)
Yiru Liao, Beijing Univ. of Technology (China)
Zhenyang Liu, Beijing Univ. of Technology (China)
Jianjun Li, Beijing Univ. of Technology (China)
Chen Xu, Beijing Univ. of Technology (China)


Published in SPIE Proceedings Vol. 10017:
Semiconductor Lasers and Applications VII
Ninghua Zhu; Werner H. Hofmann, Editor(s)

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