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Proceedings Paper

Anti-reflective sub-wavelength structures at a wavelength of 441.6 nm for phase masks of near-field lithography
Author(s): Jinyu Li; Huoyao Chen; Stefanie Kroker; Thomas Käsebier; Zhengkun Liu; Keqiang Qiu; Ying Liu; Ernst-Bernhard Kley; Xiangdong Xu; Yilin Hong; Shaojun Fu
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Paper Abstract

With the development of micro- & nanofabrication technology, micro- & nanostructures have been widely used in many fields, including spectroscopy, coding, sensor, subwavelength element, etc. With phase masks realized by a combination of electron beam lithography (EBL), near field lithography (NFH) has great potential to fabricate versatile nanostructures, because it combines the advantages of both lithographic methods. Currently, subwavelength structures attract much attention due to their various functions, such as antireflection, polarization beam splitter and filter. In this presentation, aiming at reducing the interface reflection of a fused silica mask of NFH at a wavelength of 441.6 nm and incidence angles of either 0° or 32°. First, we will compare the difference of antireflection property of one-dimensional (1D) and two-dimensional (2D) subwavelength structures with line density of 3600 lines/mm by simulation. Then, the optimized 1D and 2D subwavelength structures with 3600 lines/mm will be fabricated by using EBL-NFH method. Finally, the antireflection property of these 1D and 2D subwavelength structures will be characterized at the wavelength of 441.6 nm.

Paper Details

Date Published: 31 October 2016
PDF: 9 pages
Proc. SPIE 10022, Holography, Diffractive Optics, and Applications VII, 100220T (31 October 2016); doi: 10.1117/12.2246381
Show Author Affiliations
Jinyu Li, Univ. of Science and Technology of China (China)
Huoyao Chen, Univ. of Science and Technology of China (China)
Stefanie Kroker, Friedrich-Schiller-Univ. Jena (Germany)
Technische Univ. Braunschweig (Germany)
Physikalisch-Technische Bundesanstalt (Germany)
Thomas Käsebier, Friedrich-Schiller-Univ. Jena (Germany)
Zhengkun Liu, Univ. of Science and Technology of China (China)
Keqiang Qiu, Univ. of Science and Technology of China (China)
Ying Liu, Univ. of Science and Technology of China (China)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Xiangdong Xu, Univ. of Science and Technology of China (China)
Yilin Hong, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 10022:
Holography, Diffractive Optics, and Applications VII
Yunlong Sheng; Chongxiu Yu; Changhe Zhou, Editor(s)

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