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Silicon nitride grating waveguide based directional couplerFormat | Member Price | Non-Member Price |
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Paper Abstract
Silicon nitride is a promising wave-guiding material for integrated photonics applications with a wide transparency bandwidth from visible to mid-infrared, with a superior performance in fiber-coupling and propagation losses, more tolerant fabrication process to the structure parameters variation and compatible with the CMOS technology. Directional coupler (DC) is very popular for realizing beam splitter because of its structural simplicity and no excess loss intrinsically. Here, a conventional silicon nitride directional coupler, three-dimensional vertical coupler, and grating waveguide assisted coupler are designed and fabricated, and compared with each other. A grating waveguide based coupler with a period of 300 nm and coupling length of 26 um, can realize a wideband 3-dB splitter for the wavelength in the range from 1540 to 1620 nm, for a transverse electric (TE) polarized wave. With further optimization of the grating period and duty cycle, the device performance can be further improved with a wider bandwidth.
Paper Details
Date Published: 31 October 2016
PDF: 6 pages
Proc. SPIE 10019, Optoelectronic Devices and Integration VI, 1001905 (31 October 2016); doi: 10.1117/12.2246282
Published in SPIE Proceedings Vol. 10019:
Optoelectronic Devices and Integration VI
Xuping Zhang; Baojun Li; Changyuan Yu, Editor(s)
PDF: 6 pages
Proc. SPIE 10019, Optoelectronic Devices and Integration VI, 1001905 (31 October 2016); doi: 10.1117/12.2246282
Show Author Affiliations
Jijun Feng, Univ. of Shanghai for Science and Technology (China)
Anyuan Li, Univ. of Shanghai for Science and Technology (China)
Anyuan Li, Univ. of Shanghai for Science and Technology (China)
Ryoichi Akimoto, National Institute of Advanced Industrial Science and Technology (Japan)
Heping Zeng, Univ. of Shanghai for Science and Technology (China)
East China Normal Univ. (China)
Heping Zeng, Univ. of Shanghai for Science and Technology (China)
East China Normal Univ. (China)
Published in SPIE Proceedings Vol. 10019:
Optoelectronic Devices and Integration VI
Xuping Zhang; Baojun Li; Changyuan Yu, Editor(s)
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