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Proceedings Paper

Research of annular polishing asymmetric ZnS plane window
Author(s): Weijin Guo; Yi Tong; Yuzhu Jin; Nana Lin
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Paper Abstract

Due the annular polishing technology for planar optical components do not have the sharp selectivity, annular polishing technology is a very import process to fabricate irregular planar elements which with high precision surface shape and low surface roughness. According to the characteristics of annular polishing, the zns asymmetric plane window annular polishing process and key technical parameters control was researched. In this paper, one pair of asymmetric planar ZnS window parts were machined which diagonal length is 147mm, through technology experiments, obtained process test samples. The surface figures of the plane zns window are measured by a Zygo interferometer and the reflect wavefront P-V value is better than 1.5λ, the reflect wavefront local error rms value is better than 0.05λ (λ=632.8nm). Experiments results demonstrate the effectiveness of annular processing technology was used to manufacture zinc sulfide asymmetric shape plane window.

Paper Details

Date Published: 28 October 2016
PDF: 5 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96831Q (28 October 2016); doi: 10.1117/12.2246264
Show Author Affiliations
Weijin Guo, Tianjin Jinhang Institute of Technical Physics (China)
Tianjin Key Lab. of Optical Thin Film (China)
Yi Tong, Tianjin Jinhang Institute of Technical Physics (China)
Tianjin Key Lab. of Optical Thin Film (China)
Yuzhu Jin, Tianjin Jinhang Institute of Technical Physics (China)
Tianjin Key Lab. of Optical Thin Film (China)
Nana Lin, Tianjin Jinhang Institute of Technical Physics (China)
Tianjin Key Lab. of Optical Thin Film (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

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