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Proceedings Paper

Tunable nano-pattern generation and photolithography using hybrid Kretschmann and Otto structures
Author(s): Fuyang Xu; Chinhua Wang; Jingpei Hu
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Paper Abstract

We propose a continuous tuning SPPs interference photolithography using hybrid Kretschmann and Otto structures. The patterns are formed by the interference of two kinds of SPPs excited by Kretschmann structure and Otto structure respectively, and the tuning capability is implemented by changing the angle between the two kinds of SPPs beams and varying the amplitude and phase of corresponding incident beams. Numerical results show the flexibility and convenience in tuning of interference patterns and resolutions with high contrast, both one and two dimension periodic patterns can be generated and tuned easily. This proposed method is possible to develop a new tunable SPPs photolithography technique for fabrication of periodic nanostructures.

Paper Details

Date Published: 31 October 2016
PDF: 10 pages
Proc. SPIE 10022, Holography, Diffractive Optics, and Applications VII, 1002220 (31 October 2016); doi: 10.1117/12.2246260
Show Author Affiliations
Fuyang Xu, Zhejiang Normal Univ. (China)
Soochow Univ. (China)
Chinhua Wang, Soochow Univ. (China)
Jingpei Hu, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 10022:
Holography, Diffractive Optics, and Applications VII
Yunlong Sheng; Chongxiu Yu; Changhe Zhou, Editor(s)

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