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Proceedings Paper

Dual-wavelength method for measuring the thickness of HSQ photoresist
Author(s): Shun Yao; Bo Yu; Jingcheng Jin; Chun Li
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Paper Abstract

The reflectivity of thin film changes periodically with the increase of its thickness. According to this effect, we present a dual-wavelength method for measuring the thickness of HSQ film. At first, the refractive index of HSQ was measured by a spectroscopic ellipsometer. Then the relationship between the thickness of HSQ and the reflectivity was deduced. At last, the thickness of HSQ was calculated using the reflectivity measured by a spectrograph. The method was proved to be simple and effective.

Paper Details

Date Published: 27 September 2016
PDF: 6 pages
Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 968442 (27 September 2016); doi: 10.1117/12.2246196
Show Author Affiliations
Shun Yao, Changchun Institute of Optics and Fine Mechanics (China)
Bo Yu, Changchun Institute of Optics and Fine Mechanics (China)
Jingcheng Jin, Changchun Institute of Optics and Fine Mechanics (China)
Chun Li, Changchun Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 9684:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Yudong Zhang; Fan Wu; Ming Xu; Sandy To, Editor(s)

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