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Proceedings Paper

Control of lateral thickness gradients of EUV/soft x-ray multilayer on curved substrates
Author(s): Bo Yu; Chun-shui Jin; Shun Yao
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Paper Abstract

To meet the requirements of wavelength matching and figure preservation for EUV multilayer optics, study of precise control of the lateral thickness gradients of multilayer was performed. The distribution of the magnetron sputtering source was derived by fitting the coating thickness profiles of flat substrates sweeping across the source with constant velocity at different heights using genetic algorithm. Then, genetic algorithm was also used in finding the proper speed profiles for the desired thickness profiles. By the method mentioned above, extremely precise control of the lateral thickness gradients of multilayer on curved substrates was realized.

Paper Details

Date Published: 25 October 2016
PDF: 8 pages
Proc. SPIE 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics, 96870A (25 October 2016); doi: 10.1117/12.2246160
Show Author Affiliations
Bo Yu, Changchun Institute of Optics and Fine Mechanics (China)
Univ. of the Chinese Academy of Sciences (China)
Chun-shui Jin, Changchun Institute of Optics and Fine Mechanics (China)
Shun Yao, Changchun Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 9687:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics
Shinan Qian; Mourad Idir; Daniele Cocco; Tiqiao Xiao; Kazuto Yamauchi, Editor(s)

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