Share Email Print
cover

Proceedings Paper

Study of a grating interferometer with high optical subdivision technique
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Displacement laser interferometers and grating interferometers are two main apparatus for the micron-nanometer displacement measurement over a long range. However, the laser interferometers, whose measuring scale is based on the wavelength, are very sensitive to the environment. On the contrast, the grating interferometers change the measuring scale from wavelength to grating period, which is much stable for the measurement results. But the resolution of grating interferometer is usually lower than that of laser interferometer. Therefore, further investigation is needed to improve the performance of grating interferometer. As we known, the optical subdivision is a main factor that affects the measurement resolution. In this paper, a grating interferometer with high optical subdivision is presented based on the Littrow configuration. We mainly use right angle prisms accompanied with plane mirrors to make the measuring lights diffracted by the grating scale for many times. An optical subdivision factor of 1/24 can be obtained by this technique. A main difficulty of this technique is that the grating scale should be with high diffraction efficiency. Fortunately, the measuring light is incident on the grating scale at the Littrow angle, the grating scale can be designed with very high efficiency easily in this condition. Compared with traditional grating interferometers, this kind of grating interferometer can greatly increase the measuring resolution and accuracy, which could be widely used in nanometer-scale fabrications and measurements.

Paper Details

Date Published: 31 October 2016
PDF: 6 pages
Proc. SPIE 10022, Holography, Diffractive Optics, and Applications VII, 1002214 (31 October 2016); doi: 10.1117/12.2246091
Show Author Affiliations
Yancong Lu, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China)
Shubin Li, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Chunlong Wei, Shanghai Institute of Optics and Fine Mechanics (China)
Minkang Li, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Xiansong Xiang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Jili Deng, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Changcheng Xiang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Wei Jia, Shanghai Institute of Optics and Fine Mechanics (China)
Junjie Yu, Shanghai Institute of Optics and Fine Mechanics (China)
Jin Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)
Chao Li, Shanghai Institute of Optics and Fine Mechanics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 10022:
Holography, Diffractive Optics, and Applications VII
Yunlong Sheng; Chongxiu Yu; Changhe Zhou, Editor(s)

© SPIE. Terms of Use
Back to Top