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Proceedings Paper

Algorithms and applications of aberration correction and American standard-based digital evaluation in surface defects evaluating system
Author(s): Fan Wu; Pin Cao; Yongying Yang; Chen Li; Huiting Chai; Yihui Zhang; Haoliang Xiong; Wenlin Xu; Kai Yan; Lin Zhou; Dong Liu; Jian Bai; Yibing Shen
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Paper Abstract

The inspection of surface defects is one of significant sections of optical surface quality evaluation. Based on microscopic scattering dark-field imaging, sub-aperture scanning and stitching, the Surface Defects Evaluating System (SDES) can acquire full-aperture image of defects on optical elements surface and then extract geometric size and position information of defects with image processing such as feature recognization. However, optical distortion existing in the SDES badly affects the inspection precision of surface defects. In this paper, a distortion correction algorithm based on standard lattice pattern is proposed. Feature extraction, polynomial fitting and bilinear interpolation techniques in combination with adjacent sub-aperture stitching are employed to correct the optical distortion of the SDES automatically in high accuracy. Subsequently, in order to digitally evaluate surface defects with American standard by using American military standards MIL-PRF-13830B to judge the surface defects information obtained from the SDES, an American standard-based digital evaluation algorithm is proposed, which mainly includes a judgment method of surface defects concentration. The judgment method establishes weight region for each defect and adopts the method of overlap of weight region to calculate defects concentration. This algorithm takes full advantage of convenience of matrix operations and has merits of low complexity and fast in running, which makes itself suitable very well for highefficiency inspection of surface defects. Finally, various experiments are conducted and the correctness of these algorithms are verified. At present, these algorithms have been used in SDES.

Paper Details

Date Published: 24 November 2016
PDF: 9 pages
Proc. SPIE 10023, Optical Metrology and Inspection for Industrial Applications IV, 100230T (24 November 2016); doi: 10.1117/12.2245891
Show Author Affiliations
Fan Wu, Zhejiang Univ. (China)
Pin Cao, Hangzhou Zernike Optical Technology Co., Ltd. (China)
Yongying Yang, Zhejiang Univ. (China)
Chen Li, Zhejiang Univ. (China)
Huiting Chai, Zhejiang Univ. (China)
Yihui Zhang, Zhejiang Univ. (China)
Haoliang Xiong, Zhejiang Univ. (China)
Wenlin Xu, Zhejiang Univ. (China)
Kai Yan, Zhejiang Univ. (China)
Lin Zhou, Zhejiang Univ. (China)
Dong Liu, Zhejiang Univ. (China)
Jian Bai, Zhejiang Univ. (China)
Yibing Shen, Zhejiang Univ. (China)


Published in SPIE Proceedings Vol. 10023:
Optical Metrology and Inspection for Industrial Applications IV
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

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