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Proceedings Paper

Influencing factors and error analysis for specular gloss measurement
Author(s): Tiecheng Li; Leibing Shi; Lei Lai; Fangsheng Lin; Dejin Yin; Ming Xia; Limin Wu
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Paper Abstract

Specular gloss has been widely used to characterize the ability of a surface to reflect light specularly. Specular gloss is theoretically related to the physical properties of a surface, such as roughness, directionality and uniformity. Specular gloss, mainly determined by incident angle and refractive index of a surface, is a relative measurement quantity. Specular gloss is usually measured by a glossmeter. The topographical and optical properties of a surface have been analyzed on how to affect the measurements. The experiment results indicate that a less rough/flatter, more isotropic and more uniform surface will result in a more accurate measurement value. Therefore, physical properties of a surface must be carefully inspected before the specular gloss measurement in order to acquire a satisfied result.

Paper Details

Date Published: 27 September 2016
PDF: 6 pages
Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 968422 (27 September 2016); doi: 10.1117/12.2245804
Show Author Affiliations
Tiecheng Li, Shanghai Institute of Measurement and Testing Technology (China)
Leibing Shi, Shanghai Institute of Measurement and Testing Technology (China)
Lei Lai, Shanghai Institute of Measurement and Testing Technology (China)
Fangsheng Lin, Shanghai Institute of Measurement and Testing Technology (China)
Dejin Yin, Shanghai Institute of Measurement and Testing Technology (China)
Ming Xia, Shanghai Institute of Measurement and Testing Technology (China)
Limin Wu, Shanghai Institute of Measurement and Testing Technology (China)


Published in SPIE Proceedings Vol. 9684:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Yudong Zhang; Fan Wu; Ming Xu; Sandy To, Editor(s)

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