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Proceedings Paper

Sub-nanometer asphere fabrication and testing
Author(s): Erlong Miao; Songtao Gao; Jian Zhang; Dongqi Su
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Paper Abstract

Lithography projection objective is one of the most precise optical systems in optical manufacture field. The required accuracy of the asphere in the objective is down to nanometer and sub-nanometer, which is a great challenge for optical fabrication and testing. In this paper, the theories and technologies of sub-nanometer asphere fabrication and testing are studied and developed. Combined the sub-nanometer interference testing method and atom level polishing technologies, sub-nanometer aspheres are realized. Two kinds of testing methods are used for the measurement of the asphere and the difference of the results is less than 1nm (RMS).

Paper Details

Date Published: 27 September 2016
PDF: 6 pages
Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 96840H (27 September 2016); doi: 10.1117/12.2245724
Show Author Affiliations
Erlong Miao, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)
Songtao Gao, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jian Zhang, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)
Dongqi Su, Changchun National Extreme Precision Optics Ltd. (China)
Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 9684:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Yudong Zhang; Fan Wu; Ming Xu; Sandy To, Editor(s)

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