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Proceedings Paper

Design and simulation of large field plate lithography lens
Author(s): Chao Deng; Tingwen Xing; Wumei Lin; Xianchang Zhu
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Paper Abstract

Because industry demand for LED,LCD panel continues to increase, the high yield of micron-scale resolution lithography is increasingly prominent for manufacturers, which requires the field of lithography objective lens becomes larger. This paper designed a lithography lens with large field, whose effective image side field will reach to 132 × 132mm.Subsequently, the tolerance was analysed by simulation for the optical system. Finally, it is proved that the design meets the requirements of micron-scale resolution.

Paper Details

Date Published: 25 October 2016
PDF: 6 pages
Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850V (25 October 2016); doi: 10.1117/12.2245717
Show Author Affiliations
Chao Deng, Institute of Optics and Electronics (China)
Tingwen Xing, Institute of Optics and Electronics (China)
Wumei Lin, Institute of Optics and Electronics (China)
Xianchang Zhu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 9685:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
Xiangang Luo; Tianchun Ye; Tingwen Xin; Song Hu; Minghui Hong; Min Gu, Editor(s)

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