Share Email Print
cover

Proceedings Paper

Research on thickness uniformity correction of thin film by IBF
Author(s): Yongqiang Gu; Xiaoye Wu; Guang Shi; Xikun Cai; Lei Dai; Chunlei Zhang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Since it is difficult to control the lateral coating thickness with super high accuracy only in the depositing process, and the requirement of that is strict in deep ultraviolet lithography (DUV) objective or other systems, a method using Ion beam figuring (IBF) technique to correct lateral thickness non-uniformity of thin film has been developed, which can also be used to optimize optical elements’ surface profiles after it’s been coated. Experiments were done to test the correct effect of thickness non-uniformity by IBF. The substrate used in the experiments is a SiO2 flat and the thin film material is TiO2. The thickness non-uniformity of the thin film is measured by interferometer and expressed as surface errors, which was about root mean square (RMS) value 1.2nm before IBF correction. After 2 iterative IBF process, the RMS value of TiO2 thin film’s surface was reduced to about 0.5nm. The improvement of the surface profile indicates that the new proposed method is effective. The waviness and roughness of the TiO2 thin film were also measured by white light interferometer and atom force microscope separately before and after IBF correction; the differences of the measured results indicate that the microstructure of the thin film doesn’t change too much. Finally the transmitted and reflection spectrums of the TiO2 thin film were also measured and the variations of optical characteristics are discussed.

Paper Details

Date Published: 28 October 2016
PDF: 6 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830E (28 October 2016); doi: 10.1117/12.2245712
Show Author Affiliations
Yongqiang Gu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xiaoye Wu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Guang Shi, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Xikun Cai, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Lei Dai, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Chunlei Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

© SPIE. Terms of Use
Back to Top