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Proceedings Paper

A blu-ray laser diode based dual-beam interference lithography for fabrication of diffraction gratings for surface encoders
Author(s): Xiangwen Zhu; Xinghui Li; Qian Zhou; Xiaohao Wang; Kai Ni
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Paper Abstract

The paper presents a dual-beam interference lithography technology for fabrication of diffraction gratings for surface encoders by using cost-effective 405 nm blu-ray laser diodes. In this system, an amplitude division interferometer system is employed. A laser beam raying from a blu-ray laser diode is collimated and then divided into two beams by a beam splitter. These two beams are changed their propagation directions and interfere with each other. Generated interference fringes are exposed on the photoresist coated substrate. Grating line spacing d can be adjusted by changing the incident angle between these two beams. Grating width Wc that determines the measurement of the surface encoder is decided by the coherence length Lc of the laser diode and the grating line spacing d. Calculation and simulation were carried out to decide the grating width. Lc was experimentally obtained. A fabrication system was constructed to verify the feasibility of this technology. Diffraction gratings with a 2.5 micron line spacing and a 2.5 mm width was obtained.

Paper Details

Date Published: 9 November 2016
PDF: 6 pages
Proc. SPIE 10018, Advanced Laser Processing and Manufacturing, 100180A (9 November 2016); doi: 10.1117/12.2245710
Show Author Affiliations
Xiangwen Zhu, Tsinghua Univ. (China)
Xinghui Li, Tsinghua Univ. (China)
Qian Zhou, Tsinghua Univ. (China)
Xiaohao Wang, Tsinghua Univ. (China)
Kai Ni, Tsinghua Univ. (China)

Published in SPIE Proceedings Vol. 10018:
Advanced Laser Processing and Manufacturing
Minlin Zhong; Jonathan Lawrence; Minghui Hong; Jian Liu, Editor(s)

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