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Proceedings Paper

High-precision structure fabrication based on an etching resistance layer
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Paper Abstract

The high-precision fabrication of micro-/nano-structure is a challenge. In this paper, we proposed a new fabrication method of high-precision structure based on an etching resistance layer. The high-precision features were fabricated by photolithography technique, followed by the etching process to transfer the features to the substrate. During this process, the etching uniformity and error lead to the feature distortion. We introduced an etching resistance layer between feature layer and substrate. The etching process will stop when arriving at the resistance layer. Due to the high precision of the plating film, the high-precision structure depth was achieved. In our experiment, we introduced aluminum trioxide as the etching resistance layer. The structures with low depth error of less than 5% were fabricated.

Paper Details

Date Published: 28 October 2016
PDF: 5 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830C (28 October 2016); doi: 10.1117/12.2245685
Show Author Affiliations
Man Zhang, Institute of Optics and Electronics (China)
Qiling Deng, Institute of Optics and Electronics (China)
Lifang Shi, Institute of Optics and Electronics (China)
Axiu Cao, Institute of Optics and Electronics (China)
Hui Pang, Institute of Optics and Electronics (China)
Xin Liu, Institute of Optics and Electronics (China)
Jiazhou Wang, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

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