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Proceedings Paper

Research on effects of baffle position in an integrating sphere on the luminous flux measurement
Author(s): Fangsheng Lin; Tiecheng Li; Dejin Yin; Lei Lai; Ming Xia
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Paper Abstract

In the field of optical metrology, luminous flux is an important index to characterize the quality of electric light source. Currently, the majority of luminous flux measurement is based on the integrating sphere method, so measurement accuracy of integrating sphere is the key factor. There are plenty of factors affecting the measurement accuracy, such as coating, power and the position of light source. However, the baffle which is a key part of integrating sphere has important effects on the measurement results. The paper analyzes in detail the principle of an ideal integrating sphere. We use moving rail to change the relative position of baffle and light source inside the sphere. By experiments, measured luminous flux values at different distances between the light source and baffle are obtained, which we used to take analysis of the effects of different baffle position on the measurement. By theoretical calculation, computer simulation and experiment, we obtain the optimum position of baffle for luminous flux measurements. Based on the whole luminous flux measurement error analysis, we develop the methods and apparatus to improve the luminous flux measurement accuracy and reliability. It makes our unifying and transferring work of the luminous flux more accurate in East China and provides effective protection for our traceability system.

Paper Details

Date Published: 27 September 2016
PDF: 6 pages
Proc. SPIE 9684, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment, 96841C (27 September 2016); doi: 10.1117/12.2245572
Show Author Affiliations
Fangsheng Lin, Shanghai Institute of Measurement and Testing Technology (China)
Tiecheng Li, Shanghai Institute of Measurement and Testing Technology (China)
Dejin Yin, Shanghai Institute of Measurement and Testing Technology (China)
Lei Lai, Shanghai Institute of Measurement and Testing Technology (China)
Ming Xia, Shanghai Institute of Measurement and Testing Technology (China)


Published in SPIE Proceedings Vol. 9684:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Yudong Zhang; Fan Wu; Ming Xu; Sandy To, Editor(s)

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