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Proceedings Paper

Near-infrared absorptance enhancement and device application of nanostructured black silicon fabricated by metal-assist chemical etching
Author(s): Lieyun Huang; Hao Zhong; Naiman Liao; Fei Long; Guohui Guo; Wei Li
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Paper Abstract

We use metal-assist chemical etching (MCE) method to fabricate nanostructured black silicon on the surface of C-Si. In our MCE process, a chemical reduction reaction of silver cation (Ag+) will happen on the surface of silicon substrate, and at the same time the silicon atoms around Ag particles are oxidized and dissolved, generating nanopores and finally forming a layer called black silicon on the top of the substrates. The nanopores have diameter and depth of about 400 nm and 2 μm, respectively. Furthermore, these modified surfaces show higher light absorptance in near-infrared range (800 to 2500 nm) compared to that of C-Si with polished surfaces, and the maximum light absorptance increases significantly up to 95% in the wavelength region of 400 to 2500 nm. The Si-PIN photoelectronic detector based on this type of black silicon, in which the black silicon layer is directly set as the photosensitive surface, has a substantial increase in responsivity with about 80 nm red shift of peak responsivity, particularly at near-infrared wavelengths, rising to 0.57 A/W at 1060 nm and 0.37 A/W at 1100 nm, respectively. Our recent novel results clearly indicate that nanostructured black silicon made by MCE has a potential application in near-infrared photoelectronic detectors.

Paper Details

Date Published: 4 November 2016
PDF: 9 pages
Proc. SPIE 10027, Nanophotonics and Micro/Nano Optics III, 100271A (4 November 2016); doi: 10.1117/12.2245546
Show Author Affiliations
Lieyun Huang, Chongqing Acoustic-Optic-Electronic Co., Ltd. (China)
Hao Zhong, Univ. of Electronic Science and Technology of China (China)
Naiman Liao, Chongqing Acoustic-Optic-Electronic Co., Ltd. (China)
Fei Long, Chongqing Acoustic-Optic-Electronic Co., Ltd. (China)
Guohui Guo, Univ. of Electronic Science and Technology of China (China)
Wei Li, Univ. of Electronic Science and Technology of China (China)

Published in SPIE Proceedings Vol. 10027:
Nanophotonics and Micro/Nano Optics III
Zhiping Zhou; Kazumi Wada, Editor(s)

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