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Proceedings Paper

Multi-beam mask writer MBM-1000 and its application field
Author(s): Hiroshi Matsumoto; Hideo Inoue; Hiroshi Yamashita; Hirofumi Morita; Satoru Hirose; Munehiro Ogasawara; Hirokazu Yamada; Kiyoshi Hattori
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Paper Abstract

NuFlare has started development of multi-beam mask writer MBM-1000 aiming to apply to N5 and to release in Q4 2017. MBM-1000 is based on large area projection optics with shaping aperture array plate, blanking aperture array (BAA) plate, single cathode and inline/realtime data path for vector data rasterization and bitmap dose correction. It is designed to accomplish higher throughput than EBM series (variable shaped beam (VSB) writers) with massive beam array, higher resolution by using 10-nm beam size and 10-bit dose control, and better writing accuracy with more write passes. Configuration of MBM-1000 and flow of data path processing are described. Write time estimation suggests MBM-1000 has advantage over VSB writer with shot count > 200 Gshot/pass and resist sensitivity >75 μC/cm2. Printing test of 20 nm hp 1:1 line and space pattern with ZEP-520 resist showed better beam resolution of MBM-1000 alpha tool than EBM series.

Paper Details

Date Published: 10 May 2016
PDF: 6 pages
Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 998405 (10 May 2016); doi: 10.1117/12.2245177
Show Author Affiliations
Hiroshi Matsumoto, NuFlare Technology, Inc. (Japan)
Hideo Inoue, NuFlare Technology, Inc. (Japan)
Hiroshi Yamashita, NuFlare Technology, Inc. (Japan)
Hirofumi Morita, NuFlare Technology, Inc. (Japan)
Satoru Hirose, NuFlare Technology, Inc. (Japan)
Munehiro Ogasawara, NuFlare Technology, Inc. (Japan)
Hirokazu Yamada, NuFlare Technology, Inc. (Japan)
Kiyoshi Hattori, NuFlare Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 9984:
Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
Nobuyuki Yoshioka, Editor(s)

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