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Proceedings Paper

Effects of chemical etching on the surface quality and the laser induced damage threshold of fused silica optics
Author(s): Mathilde Pfiffer; Philippe Cormont; Jérôme Néauport; Sébastien Lambert; Evelyne Fargin; Bruno Bousquet; Marc Dussauze
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Paper Abstract

Effects of deep wet etching on the surface quality and the laser induced damage probability have been studied on fused silica samples. Results obtained with a HF/HNO3 solution and a KOH solution were compared on both polished pristine surface and scratched surfaces. The hydrofluoric solution radically deteriorated the surface quality creating a haze on the whole surface and increasing considerably the roughness. For both solutions, neither improvement nor deterioration of the laser damage performances has been observed on the etched surfaces while the laser damage resistance of scratches has been increased to the level of the surface. We conclude that laser damage performances are equivalent with both solutions but an acid etching induces surface degradation that is not experienced with basic etching.

Paper Details

Date Published: 6 December 2016
PDF: 6 pages
Proc. SPIE 10014, Laser-Induced Damage in Optical Materials 2016, 1001405 (6 December 2016); doi: 10.1117/12.2244972
Show Author Affiliations
Mathilde Pfiffer, Commissariat à l'Énergie Atomique (France)
Philippe Cormont, Commissariat à l'Énergie Atomique (France)
Jérôme Néauport, Commissariat à l'Énergie Atomique (France)
Sébastien Lambert, Commissariat à l'Énergie Atomique (France)
Evelyne Fargin, Institut de Chimie de la Matière Condensée de Bordeaux (France)
Bruno Bousquet, Ctr. Lasers Intenses et Applications, Univ. de Bordeaux, CNRS (France)
Marc Dussauze, Institut des Sciences Moléculaires, CNRS (France)


Published in SPIE Proceedings Vol. 10014:
Laser-Induced Damage in Optical Materials 2016
Greg J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau, Editor(s)

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