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Proceedings Paper

40-fs broadband low dispersion mirror thin film damage competition
Author(s): Raluca A. Negres; Christopher J. Stolz; Kyle R. P. Kafka; Enam A. Chowdhury; Matt Kirchner; Kevin Shea; Meaghan Daly
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Paper Abstract

This broadband, low dispersion mirror damage competition is a continuation of last year's test with 150 ps pulse length results published in 2015 and 40 fs pulse length results in this study. This competition allows a direct laser resistance comparison between pulse durations because the samples were laser damage tested under identical conditions. The requirements of the coatings are a minimum reflection of 99.5% at 45 degrees incidence angle at "P" polarization with a Group Delay Dispersion (GDD) of < ± 100 fs2 over a spectral range of 773 nm ± 50 nm. The choice of coating materials, design, and deposition method were left to the participant. Laser damage testing was performed using the raster scan method with a 40 fs pulse length on a single testing facility to enable a direct comparison among the participants. GDD measurements were performed to validate specification compliance. A double blind test assured sample and submitter anonymity. In addition to the laser resistance results and GDD measurements, details of the deposition processes, cleaning method, coating materials and layer count are also shared.

Paper Details

Date Published: 6 December 2016
PDF: 9 pages
Proc. SPIE 10014, Laser-Induced Damage in Optical Materials 2016, 100140E (6 December 2016); doi: 10.1117/12.2244758
Show Author Affiliations
Raluca A. Negres, Lawrence Livermore National Lab. (United States)
Christopher J. Stolz, Lawrence Livermore National Lab. (United States)
Kyle R. P. Kafka, The Ohio State Univ. (United States)
Enam A. Chowdhury, The Ohio State Univ. (United States)
Matt Kirchner, KMLabs, Inc. (United States)
Kevin Shea, KMLabs, Inc. (United States)
Meaghan Daly, KMLabs, Inc. (United States)

Published in SPIE Proceedings Vol. 10014:
Laser-Induced Damage in Optical Materials 2016
Greg J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau, Editor(s)

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