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Proceedings Paper

CVD diamond growth by dc plasma torch
Author(s): Paul Klocek; James T. Hoggins; Peter Taborek; Tom A. McKenna
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Paper Abstract

A dc arc discharge plasma torch has been developed for chemical vapor deposition (CVD) diamond growth. The apparatus and process parameters are described. Free-standing polycrystalline diamond samples of 50 mm by 50 mm by a few mm have been grown at high rates. The Raman spectra of the samples show little nondiamond structure. Transmission electron microscopy indicates that the diamond is highly twinned and has a high defect concentration. The infrared spectra indicate the presence of hydrogen contamination in the diamond via absorption bands associated with carbon-hydrogen motion. 2.

Paper Details

Date Published: 1 December 1990
PDF: 10 pages
Proc. SPIE 1325, Diamond Optics III, (1 December 1990); doi: 10.1117/12.22443
Show Author Affiliations
Paul Klocek, Texas Instruments Inc. (United States)
James T. Hoggins, Texas Instruments Inc. (United States)
Peter Taborek, Texas Instruments Inc. (United States)
Tom A. McKenna, Texas Instruments Inc. (United States)

Published in SPIE Proceedings Vol. 1325:
Diamond Optics III
Albert Feldman; Sandor Holly, Editor(s)

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