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Proceedings Paper

Stress reduction and structural properties of Ta2O5/SiO2 mixture films produced by ion-beam sputtering
Author(s): Yunti Pu; Zhao Qiao; Gang Wang; Fuming Qiu; Ping Ma; Siyu Wang
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Paper Abstract

Ta2O5/SiO2 mixture films with different composition ratios deposited by ion-beam sputtering were investigated. The different refractive indexes with different composition ratios were measured by Spectroscopic Ellipsometry. The relations between residual stress and structural properties were studied by X-ray diffraction (XRD) and transmission electron microscopy (TEM). It was found that the high compressive stress observed in SiO2 films (n=1.65-2.0, Ref. λ=500nm) was reduced significantly by mixing a properly amount of Ta2O5 Ta2O5=-234MPa<σSiO2=-510MPa). Through analyzing microstructure properties and optical properties of Ta2O5/SiO2 mixture films, we found that the residual compressive stress was only related with the intrinsic stress σintr and the extrinsic stress σext. A model of stress evolution has been proposed to illustrate the mechanism of stress reduction . The reduction of compressive stress was due to less lattice mismatch and more vacancies. Moreover, the scanning electron microscopy (SEM) result showed that the surface quality of SiO2 film was improved by mixing a relatively amount of Ta2O5 (n=1.85, Ref. λ=500nm).

Paper Details

Date Published: 28 October 2016
PDF: 8 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 968323 (28 October 2016); doi: 10.1117/12.2244163
Show Author Affiliations
Yunti Pu, Chengdu Fine Optical Engineering Research Ctr. (China)
Zhao Qiao, Chengdu Fine Optical Engineering Research Ctr. (China)
Gang Wang, Chengdu Fine Optical Engineering Research Ctr. (China)
Fuming Qiu, Chengdu Fine Optical Engineering Research Ctr. (China)
Ping Ma, Chengdu Fine Optical Engineering Research Ctr. (China)
Siyu Wang, Chengdu Fine Optical Engineering Research Ctr. (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

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