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Proceedings Paper

Optimizing design method of static simulation for Unimorph DM
Author(s): Zhanbin Fan; Yifan Dai; Guipeng Tie; Chaoliang Guan
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Paper Abstract

Single layer piezoelectric driving deformable mirror (Unimorph DM) with large deformation, simple fabrication process and low cost has been widely applied for the adaptive optics system in recent years. In the past, the optimal design of deformable mirror is often used in analytic method, and made much simplified approximation in theory. This results in large error between theoretic and real system. In this paper, the influence laws between the fitting error and the effective aperture, and the spatial distribution are studied by the dynamic–electricity coupling simulation method. The relationship between the displacement and the thickness of the mirror, the diameter and thickness of the electrode and the width of the support ring are discussed. According to these rules, a scheme of optimizing the structure of deformable mirror has been proposed, and the key parameters are designed according to the requirements of the retinal imaging system. In the end, all the fitting errors of former Zernike items 3-30 are less than 0.4 with the rated voltage of 400V.

Paper Details

Date Published: 25 October 2016
PDF: 8 pages
Proc. SPIE 9686, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices, 968606 (25 October 2016); doi: 10.1117/12.2243801
Show Author Affiliations
Zhanbin Fan, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-precision Machining Technology (China)
Yifan Dai, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-precision Machining Technology (China)
Guipeng Tie, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-precision Machining Technology (China)
Chaoliang Guan, National Univ. of Defense Technology (China)
Hunan Key Lab. of Ultra-precision Machining Technology (China)


Published in SPIE Proceedings Vol. 9686:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices
Yadong Jiang; Bernard Kippelen; Junsheng Yu, Editor(s)

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