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Proceedings Paper

Optical material removal property analysis of Ar+ and Kr+ in ion beam figuring
Author(s): Ying Lu; Xu Hui Xie; Lin Zhou; Zuo Cai Dai; Gui Yang Chen
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Paper Abstract

Ion beam figuring (IBF) provides a highly deterministic method for the final precision figuring of optical components. According to the Sigmund sputtering theory, the mass of incident ions is an important factor to the sputtering rate and the optical surface quality. Both Ar+ and Kr+ are alternative ions in IBF, but the mass of Kr+ equals two times that of Ar+. In order to achieve the nanometer and sub-nanometer precision fabrication with IBF, the optical material removal property of Ar+ and Kr+ ions was researched. The bombardment process had been simulated with the software TRIM, and the sputtering yield of Ar+ and Kr+ ions for different incident angles was calculated. Then the removal function experiments on Si were conducted. The simulations and experiments result indicated that Ar+ ion beam achieves higher removal rate at 0° incident angle, but Kr+ ion beam performs more efficiently when the incident angle gets across a critical point.

Paper Details

Date Published: 28 October 2016
PDF: 6 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 968308 (28 October 2016); doi: 10.1117/12.2243767
Show Author Affiliations
Ying Lu, National Univ. of Defense Technology (China)
Xu Hui Xie, National Univ. of Defense Technology (China)
Lin Zhou, National Univ. of Defense Technology (China)
Zuo Cai Dai, National Univ. of Defense Technology (China)
Gui Yang Chen, National Univ. of Defense Technology (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

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