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Proceedings Paper

UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication
Author(s): Qian Deng; Junbo Liu; Shaolin Zhou; Yan Tang; Lixin Zhao; Song Hu; Yinghong Chen
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Paper Abstract

The spectrum-integral Talbot lithography (STIL) was introduced into the fabrication of one-dimensional micro gratings using the broad-band UV illumination in this paper. In the process of spectrum-integral Talbot lithography, the self-images and π-phase-shifted images generated by different wave lengths overlap and integrate collectively to enormously extend the continuous depth-of-focus area since a certain distance away from the mask. As a result, the route of STIL proves to be of great potential for periodic frequency-doubling in good contrast without any complex improvement and operation to the traditional proximity lithographic system of UV mask aligner.

Paper Details

Date Published: 25 October 2016
PDF: 7 pages
Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850M (25 October 2016); doi: 10.1117/12.2243456
Show Author Affiliations
Qian Deng, Institute of Optics and Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Junbo Liu, Institute of Optics and Electronics (China)
Shaolin Zhou, South China Univ. of Technology (China)
Yan Tang, Institute of Optics and Electronics (China)
Lixin Zhao, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Yinghong Chen, Sichuan Univ. (China)


Published in SPIE Proceedings Vol. 9685:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
Xiangang Luo; Tianchun Ye; Tingwen Xin; Song Hu; Minghui Hong; Min Gu, Editor(s)

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