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Proceedings Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)
Author(s): Michael Green; Young Ham; Brian Dillon; Bryan Kasprowicz; Ik Boum Hur; Joong Hee Park; Yohan Choi; Jeff McMurran; Henry Kamberian; Daniel Chalom; Jan Klikovits; Michal Jurkovic; Peter Hudek
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Paper Abstract

As optical lithography is extended into 10nm and below nodes, advanced designs are becoming a key challenge for mask manufacturers. Techniques including advanced optical proximity correction (OPC) and Inverse Lithography Technology (ILT) result in structures that pose a range of issues across the mask manufacturing process. Among the new challenges are continued shrinking sub-resolution assist features (SRAFs), curvilinear SRAFs, and other complex mask geometries that are counter-intuitive relative to the desired wafer pattern. Considerable capability improvements over current mask making methods are necessary to meet the new requirements particularly regarding minimum feature resolution and pattern fidelity. Advanced processes using the IMS Multi-beam Mask Writer (MBMW) are feasible solutions to these coming challenges. In this paper, Part 2 of our study, we further characterize an MBMW process for 10nm and below logic node mask manufacturing including advanced pattern analysis and write time demonstration.

Paper Details

Date Published: 26 September 2016
PDF: 11 pages
Proc. SPIE 9985, Photomask Technology 2016, 99850R (26 September 2016); doi: 10.1117/12.2243407
Show Author Affiliations
Michael Green, Photronics, Inc. (United States)
Young Ham, Photronics, Inc. (United States)
Brian Dillon, Photronics, Inc. (United States)
Bryan Kasprowicz, Photronics, Inc. (United States)
Ik Boum Hur, Photronics, Inc. (United States)
Joong Hee Park, Photronics, Inc. (United States)
Yohan Choi, Photronics, Inc. (United States)
Jeff McMurran, Photronics, Inc. (United States)
Henry Kamberian, Photronics, Inc. (United States)
Daniel Chalom, IMS Nanofabrication AG (Austria)
Jan Klikovits, IMS Nanofabrication AG (Austria)
Michal Jurkovic, IMS Nanofabrication AG (Austria)
Peter Hudek, IMS Nanofabrication AG (Austria)

Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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