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Proceedings Paper

Study on dynamic photographic properties of holographic gratings
Author(s): Xiaoyang Li; Chaoming Li; Xinrong Chen; Jian Yu; Hang Zha; Jianhong Wu
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Paper Abstract

Based on holographic recording technique, a study of the precise control of grating masks has been carried out. The incident light can be heavily absorbed even that photoresist thickness is under the submicron scale. The absorption rate of the photoresist will change greatly along the exposure processing, and it can serious influence the exposure dose of the photosensitive resin in the photoresist. In the old photographic models, it can’t get practical exposure dose distribution in the photoresist. In this paper, a new nonlinear photographic model is proposed, which is based on the absorption rate changing with the exposure dose. The new model can get more accurate exposure dose than that of the old models. The experiment of the developing speed changing with the exposure dose is carried out, and the developing speed variation curve is obtained. The experiment of the absorption rate changing with the exposure dose is also carried out, and the absorption rate variation curve is obtained. The experiment of fabricate holographic grating is also carried out. The dynamic analysis model of the grating mask structure agrees with the experimental results. The new nonlinear photographic model is of great significance to improve the control precision of holographic grating mask.

Paper Details

Date Published: 28 October 2016
PDF: 7 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96830Y (28 October 2016); doi: 10.1117/12.2243281
Show Author Affiliations
Xiaoyang Li, Soochow Univ. (China)
Chaoming Li, Soochow Univ. (China)
Xinrong Chen, Soochow Univ. (China)
Jian Yu, Soochow Univ. (China)
Hang Zha, Soochow Univ. (China)
Jianhong Wu, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

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