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Proceedings Paper

Error analysis of spherical scanning mechanism used for surface defects detection
Author(s): Haoliang Xiong; Yongying Yang; Chen Li; Huiting Chai; Wenlin Xv; Kai Yan; Lin Zhou; Yang Li; Yihui Zhang; Dong Liu; Jian Bai; Yibing Shen; Pin Cao
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Paper Abstract

Subaperture stitching method is used for optics surface defects detection by defects imaging. Stitching based on position is efficient while stitching error induced by the error of the scanning mechanism may cause defects dislocation. According to the stitching error analysis of spherical optics defects, a method based on Monte Carlo simulation is proposed in this paper. Firs t the volumetric error model is established based on mult ibody system theory. On this basis, the stitching error model is established and applied to compute error by Monte Carlo simulation. Analyze error and then define the tolerance of the scanning mechanism to limit stitching error. Simulation results of an optical element whose diameter is 60mm show that the scanning mechanism should satisfy that the positioning accuracy and straightness in Y direction of X axis, the run-out errors in X and Y direction of B axis, and the verticality between X and Y axis are less than 1μm, the run-out errors in X and Y direction of C axis are less than 2.8μ m, the run-out errors of B and C are less than 4.6μm. Under such conditions, the stitching error will be less than 10μm.

Paper Details

Date Published: 28 October 2016
PDF: 9 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96831U (28 October 2016); doi: 10.1117/12.2243267
Show Author Affiliations
Haoliang Xiong, Zhejiang Univ. (China)
Yongying Yang, Zhejiang Univ. (China)
Chen Li, Zhejiang Univ. (China)
Huiting Chai, Zhejiang Univ. (China)
Wenlin Xv, Zhejiang Univ. (China)
Kai Yan, Zhejiang Univ. (China)
Lin Zhou, Zhejiang Univ. (China)
Yang Li, Zhejiang Univ. (China)
Yihui Zhang, Zhejiang Univ. (China)
Dong Liu, Zhejiang Univ. (China)
Jian Bai, Zhejiang Univ. (China)
Yibing Shen, Zhejiang Univ. (China)
Pin Cao, Hangzhou Zernike Optical Technology Co., Ltd. (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

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