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Proceedings Paper

The study on the generation method of two-dimensional airy beams based on digital blazed grating
Author(s): Yun-long Wu; Jin-song Nie; Li Shao; Xiao-quan Sun
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Paper Abstract

The common generation methods of two-dimensional airy beams were introduced briefly. The disadvantage of generation method by utilizing traditional two-dimensional digital phase masks was analyzed as well. Based on this, the digital blazed grating was introduced, as well as its corresponding theories. It was proposed that the traditional two-dimensional digital phase mask and the alterable digital blazed grating could be combined to generate a comprehensive phase mask. Thus, the diffraction orders of the airy beams could be controlled by changing the periods of improved comprehensive phase masks. Compared to the traditional two-dimensional digital phase masks, the airy beams generated by the proposed comprehensive phase mask had the advantage of controllable distances between different diffraction orders. At the same time, the specific order of the Airy beams could be strengthened, and the others could be weakened, which was useful to the subsequent study on the propagation and control of two-dimensional airy beams. The experimental results showed that: the proposed comprehensive phase masks could distinguish between the different diffraction orders of generated Airy beams. As a result, the mutual interference between different diffraction orders could be avoided effectively.

Paper Details

Date Published: 25 October 2016
PDF: 9 pages
Proc. SPIE 9686, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices, 96860T (25 October 2016); doi: 10.1117/12.2243245
Show Author Affiliations
Yun-long Wu, Hefei Electronic Institute (China)
Jin-song Nie, Hefei Electronic Institute (China)
Li Shao, Hefei Electronic Institute (China)
Xiao-quan Sun, Hefei Electronic Institute (China)


Published in SPIE Proceedings Vol. 9686:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronic Materials and Devices
Yadong Jiang; Bernard Kippelen; Junsheng Yu, Editor(s)

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