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Proceedings Paper

High accuracy measurement of power spectral density in middle spatial frequency range of optical surfaces using optical profiler
Author(s): Xudong Xu; Shuang Ma; Zhengxiang Shen; Qiushi Huang; Zhanshan Wang
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Paper Abstract

The scattering from residual optical fabrication errors in the middle spatial frequency range limits the resolution and signal-to-noise ratio of optical systems. An optical profiler is a useful tool for characterization of residual surface roughness for middle spatial frequencies. An accurate calibration and measurement strategy of the optical profiler are critical for accurate optical metrology. In this manuscript, the optical profiler is calibrated using two methods. The first one is the median filter method, based on the oblique line power spectral density of a super-smooth surface. The super-smooth surface was considered as a standard and the measured data were calibrated for a normal optical surface. The use of the median filter enables us to extend the effective frequency of the measured data. The second method applies multiple measurement and is built on the primary spectral characteristics of white noise: a random signal with a constant power spectral density and an oblique line power spectral density for a fractal surface. Through multiple measurement, the white noise decreases and more accurate values for the surface height can be obtained. Both methods can extend the ranges of effective spatial frequency and optimize the capability and utilization of the optical profiler.

Paper Details

Date Published: 25 October 2016
PDF: 10 pages
Proc. SPIE 9687, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics, 968707 (25 October 2016); doi: 10.1117/12.2243152
Show Author Affiliations
Xudong Xu, Tongji Univ. (China)
Shuang Ma, Tongji Univ. (China)
Zhengxiang Shen, Tongji Univ. (China)
Qiushi Huang, Tongji Univ. (China)
Zhanshan Wang, Tongji Univ. (China)


Published in SPIE Proceedings Vol. 9687:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subnanometer Accuracy Measurement for Synchrotron Optics and X-Ray Optics
Shinan Qian; Mourad Idir; Daniele Cocco; Tiqiao Xiao; Kazuto Yamauchi, Editor(s)

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