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Proceedings Paper

Researches on stability of microfocus electron-impact x-ray source
Author(s): Yu-tian Ma; Jun-Biao Liu; Wei-xia Zhao; Geng Niu; Li Han
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Paper Abstract

A microfocus electron-impact X-ray source with micro-beam was introduced in this paper. The tungsten cathode electrogun is used as emitting system, and the focusing system is consists of two magnetic solenoid lenses, it is effective, light and handy. The matching problems between emitting system focusing system are studied on the microfocus X-ray source. The current of the first focusing lens and the second focusing lens is 0.8A and 1.64A at the voltage of 90kV respectively, and the filament current is 2.5A. Under the condition, the micro-beam spot X-ray is gained. The test results of stability showed that the X-ray source have a excellent stability, X-ray intensity of which is 110.6±0.03μSr/hr, target current of which is 185.5±1.5μA, and the target temperature of which is 96.5±0.5°C.The resolution of micro-focus X-ray source is about 4μm by the analysis of JIMA, which meet the application requirement of microfocus X-ray source.

Paper Details

Date Published: 25 October 2016
PDF: 5 pages
Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850J (25 October 2016); doi: 10.1117/12.2243125
Show Author Affiliations
Yu-tian Ma, Institute of Electrical Engineering (China)
Jun-Biao Liu, Institute of Electrical Engineering (China)
Wei-xia Zhao, Institute of Electrical Engineering (China)
Geng Niu, Institute of Electrical Engineering (China)
Li Han, Institute of Electrical Engineering (China)


Published in SPIE Proceedings Vol. 9685:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
Xiangang Luo; Tianchun Ye; Tingwen Xin; Song Hu; Minghui Hong; Min Gu, Editor(s)

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