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Proceedings Paper

Acoustic characterization of two megasonic devices for photomask cleaning
Author(s): Claudio Zanelli; Dushyanth Giridhar; Manish Keswani; Nagaya Okada; Jyhwei Hsu; Petrie Yam
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Paper Abstract

Wet photomask cleaning relies on megasonic agitation to enhance the process, but there are many challenges to reliably maximize particle removal efficiency (PRE) and minimize damage. With the shift to pellicle-free EUV masks, photomask processes are more vulnerable to contamination, increasing the urgency to improve the cleaning process. This difficulty is largely due to the unavailability of appropriate measurement of the acoustic field. Typically all that is known about the acoustic output is the driving frequency and the electric power delivered to a transducer, both global parameters that tell little about the field distribution over the substrate, the actual amplitude of the sound at the substrate, or the levels of cavitation (stable and transient) present at the substrate.

Paper Details

Date Published: 5 October 2016
PDF: 12 pages
Proc. SPIE 9985, Photomask Technology 2016, 998524 (5 October 2016); doi: 10.1117/12.2243124
Show Author Affiliations
Claudio Zanelli, Onda Corp. (United States)
Dushyanth Giridhar, Onda Corp. (United States)
Manish Keswani, The Univ. of Arizona (United States)
Nagaya Okada, Honda Electronics Co., Ltd. (Japan)
Jyhwei Hsu, SUSS MicroTec Co., Ltd. (Taiwan)
Petrie Yam, Onda Corp. (United States)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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