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Proceedings Paper

Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing
Author(s): Yoichi Matsuoka; Junichi Seki; Takahiro Nakayama; Kazuki Nakagawa; Hisanobu Azuma; Kiyohito Yamamoto; Chiaki Sato; Fumio Sakai; Yukio Takabayashi; Ali Aghili; Makoto Mizuno; Jin Choi; Chris E. Jones
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Paper Abstract

Imprint lithography has been shown to be an effective technique for replication of nano-scale features. Jet and Flash* Imprint Lithography (J-FIL*) involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto the substrate. The patterned mask is lowered into the fluid which then quickly flows into the relief patterns in the mask by capillary action. Following this filling step, the resist is crosslinked under UV radiation, and then the mask is removed, leaving a patterned resist on the substrate. There are many criteria that determine whether a particular technology is ready for wafer manufacturing. Defectivity and mask life play a significant role relative to meeting the cost of ownership (CoO) requirements in the production of semiconductor devices. Hard particles on a wafer or mask create the possibility of inducing a permanent defect on the mask that can impact device yield and mask life. By using material methods to reduce particle shedding and by introducing an air curtain system, the lifetime of both the master mask and the replica mask can be extended. In this work, we report results that demonstrate a path towards achieving mask lifetimes of better than 1000 wafers. On the mask side, a new replication tool, the FPA-1100 NR2 is introduced. Mask replication is required for nanoimprint lithography (NIL), and criteria that are crucial to the success of a replication platform include both particle control, resolution and image placement accuracy. In this paper we discuss the progress made in both feature resolution and in meeting the image placement specification for replica masks.

Paper Details

Date Published: 4 October 2016
PDF: 8 pages
Proc. SPIE 9985, Photomask Technology 2016, 99851G (4 October 2016); doi: 10.1117/12.2243114
Show Author Affiliations
Yoichi Matsuoka, Canon Inc. (Japan)
Junichi Seki, Canon Inc. (Japan)
Takahiro Nakayama, Canon Inc. (Japan)
Kazuki Nakagawa, Canon Inc. (Japan)
Hisanobu Azuma, Canon Inc. (Japan)
Kiyohito Yamamoto, Canon Inc. (Japan)
Chiaki Sato, Canon Inc. (Japan)
Fumio Sakai, Canon Inc. (Japan)
Yukio Takabayashi, Canon Inc. (Japan)
Ali Aghili, Canon Nanotechnologies, Inc. (United States)
Makoto Mizuno, Canon Nanotechnologies, Inc. (United States)
Jin Choi, Canon Nanotechnologies, Inc. (United States)
Chris E. Jones, Canon Nanotechnologies, Inc. (United States)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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