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Proceedings Paper

Correction on the edge collapse during the synchrospeed polishing process
Author(s): Peng Wang; Yang Liu; Bingqin Zhang; Yi Shen; Hao Zhang; Changshun Hui
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Paper Abstract

In the last few years, synchrospeed polishing has been widely employed in the mass spherical optical surface manufacturing process with the development of the optical polishing technology and equipment. However, the edge collapse appears easily in the synchrospeed polishing process because of the high edge pressure. The principle of the spherical surface synchrospeed polishing process is introduced, and the motion mathematical model is developed. A new multi-mode polishing method which utilizes a big polishing tool combined with a small one to correction on the edge collapse is proposed. A sphere that aperture is 110mm and radiuses is 238mm is polished via the mew method. The collapse radio is decease from 20% to 10%, and the D-value of collapse is deceased from 459.29nm to 68.74nm before and after the correct polishing process. The surface figure accuracy RMS is improved from 90.97nm to 15.97nm accordingly. The experiment proved that the correction method is very useful to correct the edge collapse.

Paper Details

Date Published: 28 October 2016
PDF: 6 pages
Proc. SPIE 9683, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 96831R (28 October 2016); doi: 10.1117/12.2243018
Show Author Affiliations
Peng Wang, Tianjin Jinhang Institute of Technical Physics (China)
Yang Liu, Tianjin Jinhang Institute of Technical Physics (China)
Bingqin Zhang, Tianjin Jinhang Institute of Technical Physics (China)
Yi Shen, Tianjin Jinhang Institute of Technical Physics (China)
Hao Zhang, Tianjin Jinhang Institute of Technical Physics (China)
Changshun Hui, Tianjin Jinhang Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 9683:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Wenhan Jiang; Li Yang; Oltmann Riemer; Shengyi Li; Yongjian Wan, Editor(s)

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