Share Email Print
cover

Proceedings Paper

YieldStar based reticle 3D measurements and its application
Author(s): Vidya Vaenkatesan; Jo Finders; Peter ten Berge; Reinder Plug; Anko Sijben; Twan Schellekens; Harm Dillen; Wojciech Pocobiej; Vasco Guerreiro Jorge; Jurgen van Dijck
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

YieldStar (YS) is an established ASML-built scatterometer that is capable of measuring wafer Critical Dimension (CD), Overlay and Focus. In a recent work, the application range of YS was extended to measure 3D CD patterns on a reticle (pattern CD, height, Side Wall Angle-SWA). The primary motivation for this study came from imaging studies that indicated a need for measuring and controlling reticle 3D topography. CD scanning electron microscope (CD-SEM), Atomic force microscope (AFM), 3D multiple detector SEM (3D-SEM) are the preferred tools for reticle metrology. While these tools serve the industry well, the current research to the impact of reticle 3D involves extensive costs, logistic challenges and increased reticle lead time. YS provides an attractive alternative as it can measure pattern CD, SWA and height in a single measurement and at high throughput. This work demonstrates the capability of YS as a reticle metrology tool.

Paper Details

Date Published: 26 September 2016
PDF: 7 pages
Proc. SPIE 9985, Photomask Technology 2016, 99850M (26 September 2016); doi: 10.1117/12.2242857
Show Author Affiliations
Vidya Vaenkatesan, ASML Netherlands B.V. (Netherlands)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Peter ten Berge, ASML Netherlands B.V. (Netherlands)
Reinder Plug, ASML Netherlands B.V. (Netherlands)
Anko Sijben, ASML Netherlands B.V. (Netherlands)
Twan Schellekens, ASML Netherlands B.V. (Netherlands)
Harm Dillen, ASML Netherlands B.V. (Netherlands)
Wojciech Pocobiej, ASML Netherlands B.V. (Netherlands)
Vasco Guerreiro Jorge, ASML Netherlands B.V. (Netherlands)
Jurgen van Dijck, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

© SPIE. Terms of Use
Back to Top