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Proceedings Paper

Soft-substrate rigid-feature (SSRF) mold for nanoimprint lithography
Author(s): Liran Menachem; Mark Schvartzman
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Paper Abstract

In this work, we introduce a novel concept of hybrid nano-imprint mold based on a soft substrate with rigid relief features. Our approach combines the advantages of soft and rigid molding approaches, and at the same time overcomes their drawbacks. Specifically, this mold provides a unique combination of: (1) High pattern fidelity and small feature size as offered by hard molds and (2) low sensitivity to defects and ability to pattern curved substrates as offered by soft molds. The SSRF mold was fabricated by electron-beam lithography of Hydrogen Silsesquioxane (HSQ) on a sacrificial substrate, followed by transferring the obtained HSQ features to elastomeric PDMS substrate. The pattern replication was demonstrated on nano imprint of UV-curable resist.

Paper Details

Date Published: 22 September 2016
PDF: 6 pages
Proc. SPIE 9919, Nanophotonic Materials XIII, 99190P (22 September 2016); doi: 10.1117/12.2242735
Show Author Affiliations
Liran Menachem, Ben-Gurion Univ. of the Negev (Israel)
Mark Schvartzman, Ben-Gurion Univ. of the Negev (Israel)


Published in SPIE Proceedings Vol. 9919:
Nanophotonic Materials XIII
Stefano Cabrini; Gilles Lérondel; Adam M. Schwartzberg; Taleb Mokari, Editor(s)

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