Share Email Print
cover

Proceedings Paper

X-ray microscopy using reflection targets based on SEM with tungsten filament
Author(s): Junbiao Liu; Yutian Ma; Weixia Zhao; Geng Niu; Mingzhang Chu; Bohua Yin; Li Han; Baodong Liu
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

X-ray MicroandNano imaging is developed based on the conventional x–ray tomography, it can not only provide nondestructive testing with higher resolution measurement, but also be used to examine the material or the structure with low atomic number and low density. The source with micro-focal spot size is one of the key components of x-ray MicroandNano imaging. The focused electron beam from SEM bombarding the metal target can generate x-ray with ultra-small size. It is convenient to set up x-ray microscopy based on SEM for laboratory use. This paper describes a new x-ray microscopy using reflection targets based on FEI Quanta600 SEM with tungsten filament. The flat panel detector is placed outside of the vacuum chamber with 300μm thickness Be-window to isolate vacuum from the air. A stage with 3 DOFs is added to adjust the positions of the target, the SEM’s sample stage is used to move sample. And the shape of target is designed as cone with 60° half cone angle to get the maximum x-ray dosage. The attenuation coefficient of Bewindow for x-ray is about 25%. Finally, the line pair card is used to evaluate the resolution and the result shows that the resolution of the system can receive less than 750nm, when the acceleration voltage is 30keV, the beam current is 160nA, the SEM working distance is 5mm and the acquisition time of the detector is 60s.

Paper Details

Date Published: 25 October 2016
PDF: 6 pages
Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 96850I (25 October 2016); doi: 10.1117/12.2241728
Show Author Affiliations
Junbiao Liu, Institute of Electrical Engineering (China)
Yutian Ma, Institute of Electrical Engineering (China)
Weixia Zhao, Institute of Electrical Engineering (China)
Geng Niu, Institute of Electrical Engineering (China)
Mingzhang Chu, Institute of Electrical Engineering (China)
Bohua Yin, Institute of Electrical Engineering (China)
Li Han, Institute of Electrical Engineering (China)
Baodong Liu, Institute of High Energy Physics (China)
Beijing Engineering Research Ctr. of Radiographic Techniques and Equipment (China)


Published in SPIE Proceedings Vol. 9685:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
Xiangang Luo; Tianchun Ye; Tingwen Xin; Song Hu; Minghui Hong; Min Gu, Editor(s)

© SPIE. Terms of Use
Back to Top