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Proceedings Paper

Quantitative simulation of photo-oxidation in OMOG by ArF exposure
Author(s): Taeki An; Jong-Min Kim; Hyo-Jin Ahn; Ik-Boum Hur; Sang-Soo Choi
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Date Published:
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Proc. SPIE 9985, Photomask Technology 2016, 998514; doi: 10.1117/12.2241356
Show Author Affiliations
Taeki An, PKL Co., Ltd. (Korea, Republic of)
Jong-Min Kim, PKL Co., Ltd. (Korea, Republic of)
Hyo-Jin Ahn, PKL Co., Ltd. (Korea, Republic of)
Ik-Boum Hur, PKL Co., Ltd. (Korea, Republic of)
Sang-Soo Choi, PKL Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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