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Proceedings Paper

Analysis and amelioration about the cross-sensitivity of a high resolution MOEMS accelerometer based on diffraction grating
Author(s): Qianbo Lu; Jian Bai; Kaiwei Wang; Shuqi Lou; Xufen Jiao; Dandan Han
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Paper Abstract

Cross-sensitivity is a crucial parameter since it detrimentally affect the performance of an accelerometer, especially for a high resolution accelerometer. In this paper, a suite of analytical and finite-elements-method (FEM) models for characterizing the mechanism and features of the cross-sensitivity of a single-axis MOEMS accelerometer composed of a diffraction grating and a micromachined mechanical sensing chip are presented, which have not been systematically investigated yet. The mechanism and phenomena of the cross-sensitivity of this type MOEMS accelerometer based on diffraction grating differ quite a lot from the traditional ones owing to the identical sensing principle. By analyzing the models, some ameliorations and the modified design are put forward to suppress the cross-sensitivity. The modified design, achieved by double sides etching on a specific double-substrate-layer silicon-on-insulator (SOI) wafer, is validated to have a far smaller cross-sensitivity compared with the design previously reported in the literature. Moreover, this design can suppress the cross-sensitivity dramatically without compromising the acceleration sensitivity and resolution.

Paper Details

Date Published: 25 October 2016
PDF: 8 pages
Proc. SPIE 9685, 8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials, 968504 (25 October 2016); doi: 10.1117/12.2241339
Show Author Affiliations
Qianbo Lu, State Key Lab. of Modern Optical Instrumentation (China)
Jian Bai, State Key Lab. of Modern Optical Instrumentation (China)
Kaiwei Wang, State Key Lab. of Modern Optical Instrumentation (China)
Shuqi Lou, State Key Lab. of Modern Optical Instrumentation (China)
Xufen Jiao, State Key Lab. of Modern Optical Instrumentation (China)
Dandan Han, State Key Lab. of Modern Optical Instrumentation (China)


Published in SPIE Proceedings Vol. 9685:
8th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems; and Smart Structures and Materials
Xiangang Luo; Tianchun Ye; Tingwen Xin; Song Hu; Minghui Hong; Min Gu, Editor(s)

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