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Proceedings Paper

Development of advanced multi-tone mask by using two different transmittance modulation materials
Author(s): Sei-Min Kim; Min-Ki Choi; Seong-Min Seo; Jong-Hwa Lee; Cheol Shin; Woo-Gun Jeong; Sung-Mo Jung; Kee-Soo Nam
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Paper Abstract

Multi-tone mask (MTM) consists of more than two layers having different transmittance modulation layers. A novel method is proposed to manufacture a MTM based on two kinds of transmittance modulation materials such as chromium and molybdenum. Different modulation materials cannot be only act as etch-stopper to each other, but also they play a role as a separator between the layers consisted of MTM. Furthermore, clearly classified modulation layers contribute to define one of the targeted transmittance according to different etching process. Especially, a conventional MTM requires three mask writing processes to form three patterns whereas the proposed MTM structure makes it possible to form three patterns by using only two mask writing processes. It is found that the turnaround time of proposed MTM is remarkably decreased as value of 30% compared to that of conventional MTM. MoSi-/Cr-based tri-tone mask configuration having 37, 15, and 0% of transmittance had been demonstrated based on the optimized thin-film conditions. Optical uniformity characteristics were also carried out to evaluate the photomask performance. Consequently, the proposed MTM is not only expected to extend the variation of objective transmittance, but also it is a very promise method for achieving a high performance photo-mask by reducing its fabrication cost.

Paper Details

Date Published: 26 September 2016
PDF: 10 pages
Proc. SPIE 9985, Photomask Technology 2016, 99850D (26 September 2016); doi: 10.1117/12.2241336
Show Author Affiliations
Sei-Min Kim, S&S Tech Corp. (Korea, Republic of)
Min-Ki Choi, S&S Tech Corp. (Korea, Republic of)
Seong-Min Seo, S&S Tech Corp. (Korea, Republic of)
Jong-Hwa Lee, S&S Tech Corp. (Korea, Republic of)
Cheol Shin, S&S Tech Corp. (Korea, Republic of)
Woo-Gun Jeong, Photronics-PKL (Korea, Republic of)
Sung-Mo Jung, Photronics-PKL (Korea, Republic of)
Kee-Soo Nam, S&S Tech Corp. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9985:
Photomask Technology 2016
Bryan S. Kasprowicz; Peter D. Buck, Editor(s)

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